Advanced Texts in Physics

High-Resolution X-Ray Scattering

From Thin Films to Lateral Nanostructures

Authors: Pietsch, Ullrich, Holy, Vaclav, Baumbach, Tilo

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  • ISBN 978-1-4757-4050-9
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  • ISBN 978-0-387-40092-1
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  • ISBN 978-1-4419-2307-3
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About this Textbook

During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap­ pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.

Table of contents (14 chapters)

  • Elements for Designing an X-Ray Diffraction Experiment

    Pietsch, Ullrich (et al.)

    Pages 5-29

  • Diffractometers and Reflectometers

    Pietsch, Ullrich (et al.)

    Pages 31-42

  • Scans and Resolution in Angular and Reciprocal Space

    Pietsch, Ullrich (et al.)

    Pages 43-58

  • Basic Principles

    Pietsch, Ullrich (et al.)

    Pages 63-74

  • Kinematical Theory

    Pietsch, Ullrich (et al.)

    Pages 75-95

Buy this book

eBook $129.00
price for USA (gross)
valid through November 5, 2017
  • ISBN 978-1-4757-4050-9
  • Digitally watermarked, DRM-free
  • Included format: PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Hardcover $169.00
price for USA
valid through November 5, 2017
  • ISBN 978-0-387-40092-1
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
Softcover $169.00
price for USA
valid through November 5, 2017
  • ISBN 978-1-4419-2307-3
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
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Bibliographic Information

Bibliographic Information
Book Title
High-Resolution X-Ray Scattering
Book Subtitle
From Thin Films to Lateral Nanostructures
Authors
Series Title
Advanced Texts in Physics
Copyright
2004
Publisher
Springer-Verlag New York
Copyright Holder
Springer Science+Business Media New York
eBook ISBN
978-1-4757-4050-9
DOI
10.1007/978-1-4757-4050-9
Hardcover ISBN
978-0-387-40092-1
Softcover ISBN
978-1-4419-2307-3
Series ISSN
1439-2674
Edition Number
2
Number of Pages
XVI, 408
Number of Illustrations and Tables
389 b/w illustrations
Additional Information
Originally published as Volume 149 in the series: Springer Tracts in Modern Physics
Topics