Physics of Atoms and Molecules

Fundamental Electron Interactions with Plasma Processing Gases

Authors: Christophorou, Loucas G., Olthoff, James K.

Buy this book

eBook $309.00
price for USA (gross)
  • ISBN 978-1-4419-8971-0
  • Digitally watermarked, DRM-free
  • Included format: PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Hardcover $389.00
price for USA
  • ISBN 978-0-306-48037-9
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
Softcover $389.00
price for USA
  • ISBN 978-1-4613-4741-5
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
About this book

This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro­ vides an up-to-date and comprehensive account of the fundamental in­ teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in­ elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the­ art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

Table of contents (6 chapters)

  • Fundamental Electron-Molecule Interactions and Their Technological Significance

    Christophorou, Loucas G. (et al.)

    Pages 1-59

  • Electron-Molecule Interactions in the Gas Phase: Cross Sections and Coefficients

    Christophorou, Loucas G. (et al.)

    Pages 61-111

  • Synthesis and Assessment of Electron Collision Data

    Christophorou, Loucas G. (et al.)

    Pages 113-134

  • Electron Interactions with CF4, C2F6, and C3F8

    Christophorou, Loucas G. (et al.)

    Pages 135-333

  • Electron Interactions with CHF3, CF3I, and c-C4F8

    Christophorou, Loucas G. (et al.)

    Pages 335-448

Buy this book

eBook $309.00
price for USA (gross)
  • ISBN 978-1-4419-8971-0
  • Digitally watermarked, DRM-free
  • Included format: PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Hardcover $389.00
price for USA
  • ISBN 978-0-306-48037-9
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
Softcover $389.00
price for USA
  • ISBN 978-1-4613-4741-5
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
Loading...

Recommended for you

Loading...

Bibliographic Information

Bibliographic Information
Book Title
Fundamental Electron Interactions with Plasma Processing Gases
Authors
Series Title
Physics of Atoms and Molecules
Copyright
2004
Publisher
Springer US
Copyright Holder
Springer Science+Business Media New York
eBook ISBN
978-1-4419-8971-0
DOI
10.1007/978-1-4419-8971-0
Hardcover ISBN
978-0-306-48037-9
Softcover ISBN
978-1-4613-4741-5
Edition Number
1
Number of Pages
XV, 781
Topics