Lecture Notes on Principles of Plasma Processing

Authors: Chen, Francis F., Chang, Jane P.

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eBook $129.00
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  • ISBN 978-1-4615-0181-7
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Softcover $169.00
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About this book

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes.

This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Table of contents (42 chapters)

Buy this book

eBook $129.00
price for USA (gross)
  • ISBN 978-1-4615-0181-7
  • Digitally watermarked, DRM-free
  • Included format: PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Softcover $169.00
price for USA
  • ISBN 978-0-306-47497-2
  • with online files
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
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Bibliographic Information

Bibliographic Information
Book Title
Lecture Notes on Principles of Plasma Processing
Authors
Copyright
2003
Publisher
Springer US
Copyright Holder
Springer Science+Business Media New York
eBook ISBN
978-1-4615-0181-7
DOI
10.1007/978-1-4615-0181-7
Softcover ISBN
978-0-306-47497-2
Edition Number
1
Number of Pages
XI, 208
Number of Illustrations and Tables
177 b/w illustrations
Topics