Scanning Electron Microscopy and X-ray Microanalysis

Third Edition

Authors: Goldstein, J., Newbury, D.E., Joy, D.C., Lyman, C.E., Echlin, P., Lifshin, E., Sawyer, L., Michael, J.R.

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About this Textbook

In the decade since the publication of the second edition of Scanning Electron Microscopy and X-Ray Microanalysis, there has been a great expansion in the capabilities of the basic scanning electron microscope (SEM) and the x-ray spectrometers. The emergence of the variab- pressure/environmental SEM has enabled the observation of samples c- taining water or other liquids or vapor and has allowed for an entirely new class of dynamic experiments, that of direct observation of che- cal reactions in situ. Critical advances in electron detector technology and computer-aided analysis have enabled structural (crystallographic) analysis of specimens at the micrometer scale through electron backscatter diffr- tion (EBSD). Low-voltage operation below 5 kV has improved x-ray spatial resolution by more than an order of magnitude and provided an effective route to minimizing sample charging. High-resolution imaging has cont- ued to develop with a more thorough understanding of how secondary el- trons are generated. The ?eld emission gun SEM, with its high brightness, advanced electron optics, which minimizes lens aberrations to yield an - fective nanometer-scale beam, and “through-the-lens” detector to enhance the measurement of primary-beam-excited secondary electrons, has made high-resolution imaging the rule rather than the exception. Methods of x-ray analysis have evolved allowing for better measurement of specimens with complex morphology: multiple thin layers of different compositions, and rough specimens and particles. Digital mapping has transformed classic x-ray area scanning, a purely qualitative technique, into fully quantitative compositional mapping.

Reviews

“There is no other single volume that covers as much theory and practice of SEM or X-ray microanalysis as Scanning Electron Microscopy and X-ray Microanalysis, 3rd Edition does. It is clearly written ... well organized. ... This is a reference text that no SEM or EPMA laboratory should be without.” (Thomas J. Wilson, Scanning, Vol. 27 (4), July/August, 2005)

“As the authors pointed out, the number of equations in the book is kept to a minimum, and important conceptions are also explained in a qualitative manner. A lot of very distinct images and schematic drawings make for a very interesting book and help readers who study scanning electron microscopy and X-ray microanalysis. The principal application and sample preparation given in this book are suitable for undergraduate students and technicians learning SEEM and EDS/WDS analyses. It is an excellent textbook for graduate students, and an outstanding reference for engineers, physical, and biological scientists.” (Microscopy and Microanalysis, Vol. 9 (5), October, 2003)


Table of contents (15 chapters)

  • Introduction

    Goldstein, Joseph I. (et al.)

    Pages 1-20

  • The SEM and Its Modes of Operation

    Goldstein, Joseph I. (et al.)

    Pages 21-60

  • Electron Beam–Specimen Interactions

    Goldstein, Joseph I. (et al.)

    Pages 61-98

  • Image Formation and Interpretation

    Goldstein, Joseph I. (et al.)

    Pages 99-193

  • Special Topics in Scanning Electron Microscopy

    Goldstein, Joseph I. (et al.)

    Pages 195-270

Buy this book

eBook $69.99
price for USA (gross)
  • ISBN 978-1-4615-0215-9
  • Digitally watermarked, DRM-free
  • Included format: PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Hardcover $99.00
price for USA
  • ISBN 978-0-306-47292-3
  • with online files
  • Free shipping for individuals worldwide
  • Online orders shipping within 2-3 days.
Softcover $99.00
price for USA
  • ISBN 978-1-4613-4969-3
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
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Bibliographic Information

Bibliographic Information
Book Title
Scanning Electron Microscopy and X-ray Microanalysis
Book Subtitle
Third Edition
Authors
Copyright
2003
Publisher
Springer US
Copyright Holder
Springer Science+Business Media New York
eBook ISBN
978-1-4615-0215-9
DOI
10.1007/978-1-4615-0215-9
Hardcover ISBN
978-0-306-47292-3
Softcover ISBN
978-1-4613-4969-3
Edition Number
3
Number of Pages
XIX, 689
Topics