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Tetrahedrally Bonded Amorphous Carbon Films I

Basics, Structure and Preparation

  • Book
  • © 2018

Overview

  • Presents all aspects of carbon films: structure, preparation, and properties
  • Discusses in-depth the application of carbon films and their advantages
  • Serves as a useful reference for researchers and graduate students alike

Part of the book series: Springer Series in Materials Science (SSMATERIALS, volume 263)

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Table of contents (17 chapters)

  1. Carbon Materials and Coatings

  2. Structural Development of ta-C Films

  3. Vacuum Arc Deposition of Carbon Films

  4. Deposition of ta-C Films by Pulsed Laser and by Sputtering

Keywords

About this book

This book presents the status quo of the structure, preparation, properties and applications of tetrahedrally bonded amorphous carbon (ta-C) films and compares them with related film systems.
 
Tetrahedrally bonded amorphous carbon films (ta-C) combine some of the outstanding properties of diamond with the versatility of amorphous materials. The book compares experimental results with the predictions of theoretical analyses, condensing them to practicable rules. It is strictly application oriented, emphasizing the exceptional potential of ta-C for tribological coatings of tools and components.



Authors and Affiliations

  • Fraunhofer Institut für Werkstoff- und Strahltechnik, Dresden, Germany

    Bernd Schultrich

About the author

After some years in the semiconductor industry, Prof. Schultrich (born 1942) worked for more than ten years at the Technical University of Dresden, Dresden in the field of theoretical physics and its application to the micromechanics of solids. He then joined the Central Institute of Solid State Physics and Materials Research of the Academy of Sciences, Dresden working for ten years on fundamental problems of preparation and properties of refractory carbides and nitrides and corresponding composites (hardmetals and cermets) and their application in the tool industry. From 1990 up to his retirement, he headed the PVD (physical vapour deposition) thin film department in the Fraunhofer Institute for Materials and Beam Technology, Dresden. His activities were concentrated on arc and laser-assisted ablation and deposition technologies for industrial applications with the main focus on carbon-based materials. Here his group achieved the breakthrough for the industrial maturity of ta-C (tetrahedral amorphous carbon) films and their preparation.

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