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Progress in Nano-Electro Optics III

Industrial Applications and Dynamics of the Nano-Optical System

  • Book
  • © 2005

Overview

Editors:
  1. Motoichi Ohtsu

    1. Department of Electronics Engineering School of Engineering, The University of Tokyo, Tokyo, Japan

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  • An up-to-date status report representing the current State of the art in nano-optics
  • Will be useful to all researchers working at the forefront of nearfield optics and nanoelectro-optics

Part of the book series: Springer Series in Optical Sciences (SSOS, volume 96)

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Table of contents (5 chapters)

  1. Front Matter

    Pages I-XIV
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  2. Near-Field Optical Fiber Probes and the Imaging Applications

    • S. Mononobe
    Pages 1-55

  3. A Novel Method for Forming Uniform Surface-Adsorbed Metal Particles and Development of a Localized Surface-Plasmon Resonance Sensor

    • H. Takei, M. Himmelhaus
    Pages 57-92

  4. Near-Field Optical-Head Technology for High-Density, Near-Field Optical Recording

    • T. Matsumoto
    Pages 93-126

  5. Nano-Optical Media for Ultrahigh-Density Storage

    • K. Naito, H. Hieda, T. Ishino, K. Tanaka, M. Sakurai, Y. Kamata et al.
    Pages 127-144

  6. A Phenomenological Description of Optical Near Fields and Optical Properties of N Two-Level Systems Interacting with Optical Near Fields

    • A. Shojiguchi, K. Kobayashi, S. Sangu, K. Kitahara, M. Ohtsu
    Pages 145-220

  7. Back Matter

    Pages 221-226
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Keywords

About this book

Near-?eld optical recording is a promising way to realize a recording density 2 of over 1 Tb/in . In this chapter, we focused on the near-?eld optical head, which is a key device for near-?eld optical recording. First, we explained the technical issues regarding the near-?eld optical head and introduced some solutions to these issues. We focused on a highly e?cient near-?eld optical head that uses a wedge-shaped metallic plate, and described its optical pr- erties based on a simulation using a ?nite-di?erence time-domain method. The simulation results con?rmed that a strong optical near ?eld is generated at the apex of the metallic plate when a plasmon is excited in the metallic plate. When a TbFeCo recording medium was placed 10 nm from the ne- ?eld optical head, the size of the optical spot was 30 nm, which corresponds 2 to an areal recording density of approximately 1 Tb/in . The e?ciency was 20% if we assume that the incident beam was a Gaussian beam with a full width at half-maximum of 1µ m. Furthermore, we discussed an optical head using two metallic plates. We con?rmed through our simulation that a highly localized optical near ?eld was generated at the gap when the plasmon was excited in the metallic plates. The distribution was 5 nm by 5 nm when the two apices were separated by 5 nm.

Editors and Affiliations

  • Department of Electronics Engineering School of Engineering, The University of Tokyo, Tokyo, Japan

    Motoichi Ohtsu

About the editor

Dr. M. Ohtsu is currently a professor of Tokyo Institute of Technology. He is also a project leader of SORST Nanophotonics Team, Japan Science and TechnologyAgency. He has been a president of IEEE LEOS Japan Chapter. He has also been a member of the board of directors, Japan Society of Applied Physics. He is a fellow of Optical Society of America.

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