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Materials - Surfaces, Interfaces, Thin Films, Corrosion, Coatings | Chemical Solution Deposition of Functional Oxide Thin Films

Chemical Solution Deposition of Functional Oxide Thin Films

Schneller, T., Waser, R., Kosec, M., Payne, D. (Eds.)

2013, XVII, 796 p. 390 illus., 133 illus. in color.

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  • Examines all aspects of Chemical Solution Deposition (CSD)  of functional oxide thin films

This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered

Content Level » Research

Keywords » Chemical Solution Deposition - Functional Oxide Films

Related subjects » Physical Chemistry - Production & Process Engineering - Surfaces, Interfaces, Thin Films, Corrosion, Coatings

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