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Noncontact Atomic Force Microscopy

  • Book
  • © 2002

Overview

Editors:
  1. S. Morita

    1. Department of Electronic Engineering, Graduate School of Engineering, Osaka University, Suita, Japan

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  2. R. Wiesendanger

    1. Institute of Applied Physics, MARCH, University of Hamburg, Hamburg, Germany

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  3. E. Meyer

    1. Department of Physics and Astronomy, Condensed Matter Division, University of Basel, Basel, Switzerland

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  • This book is a top state-of-the-art report on all the methods in noncontact atomic force microscopy prepared by the leading experts in the field
  • Includes supplementary material: sn.pub/extras

Part of the book series: NanoScience and Technology (NANO)

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Table of contents (20 chapters)

  1. Front Matter

    Pages I-XVIII
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  2. Introduction

    • Seizo Morita
    Pages 1-10

  3. Principle of NC-AFM

    • Franz J. Giessibl
    Pages 11-46

  4. Semiconductor Surfaces

    • Seizo Morita, Yasuhiro Sugawara
    Pages 47-77

  5. Bias Dependence of NC-AFM Images and Tunneling Current Variations on Semiconductor Surfaces

    • Toyoko Arai, Masahiko Tomitori
    Pages 79-92

  6. Alkali Halides

    • Roland Bennewitz, Martin Bammerlin, Ernst Meyer
    Pages 93-107

  7. Atomic Resolution Imaging on Fluorides

    • Michael Reichling, Clemens Barth
    Pages 109-123

  8. Atomically Resolved Imaging of a NiO(001) Surface

    • Hirotaka Hosoi, Kazuhisa Sueoka, Kazunobu Hayakawa, Koichi Mukasa
    Pages 125-134

  9. Atomic Structure, Order and Disorder on High Temperature Reconstructed α-Al2O3(0001)

    • Clemens Barth, Michael Reichling
    Pages 135-145

  10. NC-AFM Imaging of Surface Reconstructions and Metal Growth on Oxides

    • Chi Lun Pang, Geoff Thornton
    Pages 147-165

  11. Atoms and Molecules on TiO2(110) and CeO2(111) Surfaces

    • Ken-ichi Fukui, Yasuhiro Iwasawa
    Pages 167-181

  12. NC-AFM Imaging of Adsorbed Molecules

    • Yasuhiro Sugawara
    Pages 183-192

  13. Organic Molecular Films

    • Hirofumi Yamada
    Pages 193-213

  14. Single-Molecule Analysis

    • Akira Sasahara, Hiroshi Onishi
    Pages 215-231

  15. Low-Temperature Measurements: Principles, Instrumentation, and Application

    • Wolf Allers, Alexander Schwarz, Udo D. Schwarz
    Pages 233-256

  16. Theory of Non-Contact Atomic Force Microscopy

    • Masaru Tsukada, Naruo Sasaki, Michel Gauthier, Katsunori Tagami, Satoshi Watanabe
    Pages 257-278

  17. Chemical Interaction in NC-AFM on Semiconductor Surfaces

    • San-Huang Ke, Tsuyoshi Uda, Kiyoyuki Terakura, Ruben Pérez, Ivan Å tich
    Pages 279-304

  18. Contrast Mechanisms on Insulating Surfaces

    • Adam Foster, Alexander Shluger, Clemens Barth, Michael Reichling
    Pages 305-347

  19. Analysis of Microscopy and Spectroscopy Experiments

    • Hendrik Hölscher
    Pages 349-369

  20. Theory of Energy Dissipation into Surface Vibrations

    • Michel Gauthier, Lev Kantorovich, Masaru Tsukada
    Pages 371-394
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Keywords

About this book

Since 1995, the noncontact atomic force microscope (NC-AFM) has achieved remarkable progress. Based on nanomechanical methods, the NC-AFM detects the weak attractive force between the tip of a cantilever and a sample surface. This method has the following characteristics: it has true atomic resolution; it can measure atomic force interactions, i.e. it can be used in so-called atomic force spectroscopy (AFS); it can also be used to study insulators; and it can measure mechanical responses such as elastic deformation. This is the first book that deals with all of the emerging NC-AFM issues.

Reviews

"This book gives a comprehensive overview of the state-of-the-art of this dynamic force microscopy technique in 20 chapters, each written by experts in the field. It covers the theoretical basis, as well as applications to semiconducting surfaces, ionic crystals, metal oxides, and organic molecular systems including thin films, polymers, and nucleic acids . . . There are unsolved questions about the mechanisms responsible for atomic resolution but, as this well-written book displays, there has been tremendous progress in basic understanding of the technique and fascinating new applications continue to arise . . . With an increased understanding of NC-AFM, as demonstrated in this book, we are certain to see further progress in the near future."

–Materials Today

Editors and Affiliations

  • Department of Electronic Engineering, Graduate School of Engineering, Osaka University, Suita, Japan

    S. Morita

  • Institute of Applied Physics, MARCH, University of Hamburg, Hamburg, Germany

    R. Wiesendanger

  • Department of Physics and Astronomy, Condensed Matter Division, University of Basel, Basel, Switzerland

    E. Meyer

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