Editors

Editors-in-Chief:
G. Cheng, Dalian University of Technology, Dalian, China
M. Zhou, Altair Engineering, Irvine, CA, USA

Senior Advisors:
G. Allaire, UMR CNRS, Palaiseau, France
S. Azarm, University of Maryland, College Park, MD, USA
W. Chen, Northwestern University, Evanston, IL, USA
K. K. Choi, University of Iowa, Iowa City, IA, USA
J. K. Guest, Johns Hopkins University, Baltimore, MD, USA
X. Guo, Dalian University of Technology, Dalian, China 
H. A. Kim, University of California, San Diego, CA, USA
N. H. Kim, University of Florida, Gainesville, FL, USA
Y. Y. Kim, Seoul National University, Seoul, Korea
Q. Li, University of Sydney, Sydney, NSW, Australia
E. Lund, Aalborg University, Aalborg, Denmark
K. Maute, University of Colorado, Boulder, CO, USA
J. Norato, University of Connecticut, Storrs, CT, USA
G. Paulino, Princeton University, Princeton, NJ, USA
H. Rodrigues, Instituto Superior Tecnico, Lisbon, Portugal
O. Sigmund, Technical University of Denmark, Lyngby, Denmark
V. V. Toropov, Queen Mary University, London, UK
D. Tortorelli, University of Illinois Urbana-Campaign, Urbana, IL, USA
B. D. Youn, Seoul National University, Seoul, Korea

Review Editors:
E. Acar, TOBB University of Economics and Technology, Ankara, Turkey
J. Alexandersen, University of Southern Denmark, Odense, Denmark
N. Bartoli, ONERA, Toulouse, France
R. Bostanabad, University of California, Irvine, CA, USA
J. V. Carstensen, Massachusetts Institute of Technology, Cambridge, MA, USA
S. Chen, State University of New York, Stony Brook, NY, USA
S. Cho, Seoul National University, Seoul, Korea
J. Du, Tsinghua University, Beijing, China
X. Du, Missouri University of Science and Technology, Rolla, MO, USA
A. Evgrafov, Norwegian University of Science and Technology, Aalborg, Denmark
M. Gilbert, University of Sheffield, Sheffield, UK
C. Gogu, University of Toulouse, Toulouse, France
C. Hu, University of Connecticut, Ames, IA, USA
Z. Hu, University of Michigan, Dearborn, MI, USA
K. James, Georgia Institute of Technology, Atlanta, GA, USA
J. Kato, Nagoya University, Nagoya, Japan
G. Kennedy, Georgia Institute of Technology, Atlanta, GA, USA
G. Li, Dalian University of Technology, Dalian, China
Z. Luo, The University of Technology, Sydney, NSW, Australia
M. Montemurro, Arts et Metiers Paris Tech, Bordeaux, France
Y. Noh, Busan National University, Busan, Korea
M. Ohsaki, Kyoto University, Kyoto, Japan
N. Queipo, University of Zulia, Maracaibo, Venezuela
P. Ramu, Indian Institute of Technology, Madras, India
M. P. Saka, University of Bahrain, Zallaq, Bahrain
A. Schumacher, University of Wuppertal, Wuppertal, Germany
E. C. N. Silva, Universidade de Sao Paolo, Sao Paolo, Brazil
X. Song, Dalian University of Technology, Dalian, China
L. Wang, Beihang University, Beijing, China
P. Wang, University of Illinois, Urbana, IL, USA
Z. Wang, Michigan Technological University, Houghton, MI, USA
J. Wu, Technical University, Delft, Netherlands
H. Xu, University of Connecticut, Storrs, CT, USA
W. Zhang, Northwestern Polytechnical University, Xi'an, China
X. S. Zhang, University of Illinois, Urbana, IL, USA

Editorial Board:
W. Achtziger, University of Erlangen, Erlangen, Germany
J. Arora, The University of Iowa, Iowa City, IA, USA
M. P. Bendsøe, Technical University of Denmark, Lyngby, Denmark
K.-U. Bletzinger, Technical University, Munich, Germany
A. V. Cherkaev, University of Utah, Salt Lake City, UT, USA
D.-H. Choi, Hanyang University, Hanyang, Korea
A. Díaz, Michigan State University, East Lansing, MI, USA
P. Eberhard, University of Stuttgart, Stuttgart, Germany
G. Fadel, Clemson University, Clemson, SC, USA
H. C. Gea, Rutgers University, Piscataway, NJ, USA
R. V. Grandhi, Wright State University, Dayton, OH, USA
A. A. Groenwold, University of Stellenbosch, Pretoria, South Africa
J. M. Guedes, Instituto Superior Tecnico, Lisbon, Portugal
K. Jármai, University of Miskolc, Miskolc-Egyetemvaros, Hungary
F. van Keulen, Technical University, Delft, The Netherlands
U. Kirsch, Technion, Haifa, Israel
M. Kokkolaras, McGill University, Montreal, Quebec, Canada
B.M. Kwak, KAIST, Daejeon, Korea
J. R. R. A. Martins, University of Michigan, Ann Arbor, MI, USA
R. Le Riche, CNRS, Saint Etienne, France
J. Lellep, University of Tartu, Tartu, Estonia
T. Lewiński, Warsaw University of Technology, Warsaw, Poland
Q. Li, The University of Sydney, Sydney, NSW, Australia
J. Lógó, Budapest University of Technology and Economics, Budapest, Hungary
A. Messac, Howard University, Washington, DC, USA
C. A. Mota Soares, Instituto Superior Tecnico, Lisbon, Portugal
Z. Mróz, Polish Academy of Sciences, Warsaw, Poland
S. Nagendra, Pratt & Whittney, East Hartford, CT, USA
N. Olhoff, Aalborg University, Aalborg, Denmark
Y. Papalambros, University of Michigan, Ann Arbor, MI, USA
G.-J. Park, Hanyang University, Seoul, Korea
O. M. Querin, University of Leeds, Leeds, UK
A. P. Seyranian, Moscow State Lomonosov University, Moscow, Russia
J. Sienz, Swansea University, Swansea, UK
K. Svanberg, KTH Royal Institute of Technology, Stockholm, Sweden
D. Tortorelli, University of Illinois, Urbana, IL, USA
H. Yamakawa, The University of Tokyo, Tokyo, Japan
K. Yamazaki, Kanazawa University, Kanazawa, Japan
R.-J. Yang, The University of Iowa, Dearborn, MI, USA
J.-H. Zhu, Xi’an Jiaotong University, Xi’an, China