Authors:
- Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers
- Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results
- Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements
- Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation
- Includes case studies to illustrate practical problem solving
- Covers Helium ion scanning microscopy
- Organized into relatively self-contained modules – no need to "read it all" to understand a topic
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Table of contents (31 chapters)
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Front Matter
About this book
With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating bothelectron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.
- Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers
- Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results
- Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements
- Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.
- Includes case studies to illustrate practical problem solving
- Covers Helium ion scanning microscopy
- Organized into relatively self-contained modules – no need to "read it all" to understand a topic
- Includesan online supplement—an extensive "Database of Electron–Solid Interactions"—which can be accessed on SpringerLink, in Chapter 3
Keywords
- EBSD
- Electron backscatter diffraction
- Environmental SEM
- Focused ion beam
- Ion beam microanalysis
- Qualitative X-ray analysis
- Quantitative X-ray analysis
- SDD x-ray detectors
- SEM textbook
- Table top SEM
- Variable pressure SEM
- X-ray mapping
- X-ray microanalysis book
- X-ray spectral measurement
- dual column instruments
- Biological Microscopy
Reviews
Form the reviews of the third edition:
“There is no other single volume that covers as much theory and practice of SEM or X-ray microanalysis as Scanning Electron Microscopy and X-ray Microanalysis, 3rd Edition does. It is clearly written ... well organized. ... This is a reference text that no SEM or EPMA laboratory should be without.” (Thomas J. Wilson, Scanning, Vol. 27 (4), July/August, 2005)
“As the authors pointed out, the number of equations in the book is kept to a minimum, and important conceptions are also explained in a qualitative manner. A lot of very distinct images and schematic drawings make for a very interesting book and help readers who study scanning electron microscopy and X-ray microanalysis. The principal application and sample preparation given in this book are suitable for undergraduate students and technicians learning SEEM and EDS/WDS analyses. It is an excellent textbook for graduate students, and an outstanding reference for engineers, physical, and biological scientists.” (Microscopy and Microanalysis, Vol. 9 (5), October, 2003)
Authors and Affiliations
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University of Massachusetts, Amherst, USA
Joseph I. Goldstein
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National Institute of Standards and Technology, Gaithersburg, USA
Dale E. Newbury, Nicholas W.M. Ritchie, John Henry J. Scott
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Sandia National Laboratories, Albuquerque, USA
Joseph R. Michael
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University of Tennessee, Knoxville, USA
David C. Joy
About the authors
Bibliographic Information
Book Title: Scanning Electron Microscopy and X-Ray Microanalysis
Authors: Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W.M. Ritchie, John Henry J. Scott, David C. Joy
DOI: https://doi.org/10.1007/978-1-4939-6676-9
Publisher: Springer New York, NY
eBook Packages: Chemistry and Materials Science, Chemistry and Material Science (R0)
Copyright Information: Springer Science+Business Media LLC 2018
Hardcover ISBN: 978-1-4939-6674-5Published: 18 November 2017
Softcover ISBN: 978-1-4939-8269-1Published: 30 August 2018
eBook ISBN: 978-1-4939-6676-9Published: 17 November 2017
Edition Number: 4
Number of Pages: XXIII, 550
Number of Illustrations: 137 b/w illustrations, 409 illustrations in colour
Topics: Characterization and Evaluation of Materials, Spectroscopy and Microscopy, Biological Microscopy, Spectroscopy/Spectrometry, Measurement Science and Instrumentation