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Overview

The journal is an international journal focusing on fundamental research and new developments in plasma chemistry and plasma processing.

  • Check the aims and scope before submitting
  • Publishes fundamental plasma studies and studies of specific applications
  • Encompasses all types of industrial processing plasma
  • Includes studies of chemical kinetics in plasma, and the interactions of plasma with surfaces
Editor-in-Chief
  • Bruce R. Locke,
  • Anthony Murphy
Impact factor
3.6 (2022)
5 year impact factor
3.1 (2022)
Submission to first decision (median)
8 days
Downloads
203,824 (2023)

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Journal information

Electronic ISSN
1572-8986
Print ISSN
0272-4324
Abstracted and indexed in
  1. Astrophysics Data System (ADS)
  2. Baidu
  3. CLOCKSS
  4. CNKI
  5. CNPIEC
  6. Chemical Abstracts Service (CAS)
  7. Current Contents/Electronics & Telecommunications Collection
  8. Current Contents/Engineering, Computing and Technology
  9. Current Contents/Physical, Chemical and Earth Sciences
  10. Dimensions
  11. EBSCO
  12. EI Compendex
  13. Google Scholar
  14. INSPEC
  15. Japanese Science and Technology Agency (JST)
  16. Naver
  17. OCLC WorldCat Discovery Service
  18. Portico
  19. ProQuest
  20. SCImago
  21. SCOPUS
  22. Science Citation Index Expanded (SCIE)
  23. Semantic Scholar
  24. TD Net Discovery Service
  25. UGC-CARE List (India)
  26. Wanfang
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