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Ion Sources

  • Book
  • © 1999

Overview

Authors:
  1. Huashun Zhang
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    You can also search for this author in PubMed   Google Scholar

Editors:
  1. Jianrong Zhang
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    You can also search for this editor in PubMed   Google Scholar

  • This book is the most comprehensive book on ion sources as part of ion implantation technology, a newly established basic technology for microelectronic device processing

  • Includes supplementary material: sn.pub/extras

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About this book

Ion implantation has become a basic technology in device manufacturing. For efficient use of this accelerator-based technique the choice of appropriate ion sources is important. This book deals with the design and operation of ion sources. Additionally the physics of ion formation of the various elements with different charge states and charge neutralization are discussed. Ion selection and beam diagnostics are part of the book too. The presentation of the necessary equations and diagrams for the various parameters makes this book useful as a handbook for ion sources.

Bibliographic Information

  • Book Title: Ion Sources

  • Authors: Huashun Zhang

  • Editors: Jianrong Zhang

  • Publisher: Springer Berlin, Heidelberg

  • Copyright Information: Springer-Verlag Berlin Heidelberg 1999

  • Hardcover ISBN: 978-3-540-65747-7Published: 08 November 1999

  • Softcover ISBN: 978-3-642-08502-4Published: 03 December 2010

  • Edition Number: 1

  • Number of Pages: XVIII, 476

  • Additional Information: Jointly published with Science Press, Beijing, China

  • Topics: Particle Acceleration and Detection, Beam Physics, Surfaces and Interfaces, Thin Films, Engineering, general

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