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Scanning Probe Lithography

Part of the book series: Microsystems (MICT, volume 7)

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Table of contents (10 chapters)

  1. Front Matter

    Pages i-xxiii
  2. Introduction to Scanning Probe Lithography

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 1-22
  3. SPL by Electric-Field- Enhanced Oxidation

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 23-35
  4. Resist Exposure Using Field-Emitted Electrons

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 37-80
  5. SPL Linewidth Control

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 81-101
  6. Critical Dimension Patterning Using SPL

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 103-113
  7. High Speed Resist Exposure With a Single Tip

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 115-129
  8. On-Chip Lithography Control

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 131-152
  9. Scanning Probe Tips for SPL

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 153-161
  10. Scanning Probe Arrays for Lithography

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 163-189
  11. Epilog

    • Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate
    Pages 191-192
  12. Back Matter

    Pages 193-197

About this book

Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. SPL is capable of patterning sub-30nm features with nanometer-scale alignment registration. It is a relatively simple, inexpensive, reliable method for patterning nanometer-scale features on various substrates. It has potential applications for nanometer-scale research, for maskless semiconductor lithography, and for photomask patterning.
The authors of this book have been key players in this exciting new field. Calvin Quate has been involved since the beginning in the early 1980s and leads the research time that is regarded as the foremost group in this field. Hyongsok Tom Soh and Kathryn Wilder Guarini have been the members of this group who, in the last few years, have brought about remarkable series of advances in SPM lithography. Some of these advances have been in the control of the tip which has allowed the scanning speed to be increased from mum/second to mm/second. Both non-contact and in-contact writing have been demonstrated as has controlled writing of sub-100 nm lines over large steps on the substrate surface. The engineering of a custom-designed MOSFET built into each microcantilever for individual current control is another notable achievement. Micromachined arrays of probes each with individual control have been demonstrated. One of the most intriguing new aspects is the use of directly-grown carbon nanotubes as robust, high-resolution emitters.
In this book the authors concisely and authoritatively describe the historical context, the relevant inventions, and the prospects for eventual manufacturing use of this exciting new technology.

Authors and Affiliations

  • Stanford University, Stanford, USA

    Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate

Bibliographic Information

Buy it now

Buying options

eBook USD 84.99
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book USD 109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book USD 109.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Other ways to access