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  • Book
  • © 2014

Atomic Layer Deposition for Semiconductors

  • First book to connect missing link between semiconductor device engineers/designers and process engineers, material designers, and chemists
  • First book solely dedicated to the application of ALD to the semiconductor/microelectronics fields
  • Written by top experts in the field

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Table of contents (10 chapters)

  1. Front Matter

    Pages i-x
  2. Introduction

    1. Front Matter

      Pages 1-1
    2. Introduction

      • Cheol Seong Hwang, Cha Young Yoo
      Pages 3-12
  3. Fundamentals

    1. Front Matter

      Pages 13-13
    2. ALD Precursors and Reaction Mechanisms

      • Roy G. Gordon
      Pages 15-46
    3. ALD Simulations

      • Simon D. Elliott
      Pages 47-69
  4. ALD for Memory Devices

    1. Front Matter

      Pages 71-71
    2. Mass-Production Memories (DRAM and Flash)

      • Cheol Seong Hwang, Seong Keun Kim, Sang Woon Lee
      Pages 73-122
    3. PCRAM

      • Simone Raoux, Mikko Ritala
      Pages 123-148
    4. FeRAM

      • Susanne Hoffmann-Eifert, Takayuki Watanabe
      Pages 149-171
  5. ALD for Logic Devices

    1. Front Matter

      Pages 173-173
    2. Front End of the Line Process

      • Jeong Hwan Han, Moonju Cho, Annelies Delabie, Tae Joo Park, Cheol Seong Hwang
      Pages 175-208
    3. Back End of the Line

      • Hyungjun Kim, Soo-Hyun Kim, H. -B. -R. Lee
      Pages 209-238
  6. ALD Machines

    1. Front Matter

      Pages 239-239
    2. ALD Machines

      • Schbuert Chu
      Pages 241-255
  7. Back Matter

    Pages 257-263

About this book

This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.

Editors and Affiliations

  • Department of Materials Science and Engi, Seoul National University, Seoul, Korea, Republic of (South Korea)

    Choel Seong Hwang

About the editor

 Cheol Seong Hwang received M.S. and Ph.D. degrees from Seoul National University, Seoul, Korea, in 1989 and 1993, respectively. In 1993, he joined the Material Science and Engineering Laboratory at the National Institutes of Standards and Technology, Gaithersburg, MD, as a Postdoctoral Research Fellow. He then joined Samsung Electronics Company, Ltd., as a Senior Researcher in 1994. In 1998, Dr. Hwang became a professor in the department of material science and engineering at Seoul National University. He has authored or coauthored more than 380 papers in international peer-reviewed scientific journals, which have been cited more than 7,500 times.Dr. Hwang was a recipient of the Alexander von Humboldt Fellowship Award, the 7th Presidential Young Scientist Award of the Korean government, and Faculty Excellent Award of Air Products, USA.

Bibliographic Information

Buy it now

Buying options

eBook USD 139.00
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book USD 179.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book USD 179.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Other ways to access