Logo - springer
Slogan - springer

Engineering - Electronics & Electrical Engineering | High Permittivity Gate Dielectric Materials

High Permittivity Gate Dielectric Materials

Kar, Samares (Ed.)

2013, XXXII, 489 p. 325 illus., 168 illus. in color.

Available Formats:
eBook
Information

Springer eBooks may be purchased by end-customers only and are sold without copy protection (DRM free). Instead, all eBooks include personalized watermarks. This means you can read the Springer eBooks across numerous devices such as Laptops, eReaders, and tablets.

You can pay for Springer eBooks with Visa, Mastercard, American Express or Paypal.

After the purchase you can directly download the eBook file or read it online in our Springer eBook Reader. Furthermore your eBook will be stored in your MySpringer account. So you can always re-download your eBooks.

 
$139.00

(net) price for USA

ISBN 978-3-642-36535-5

digitally watermarked, no DRM

Included Format: PDF and EPUB

download immediately after purchase


learn more about Springer eBooks

add to marked items

Hardcover
Information

Hardcover version

You can pay for Springer Books with Visa, Mastercard, American Express or Paypal.

Standard shipping is free of charge for individual customers.

 
$179.00

(net) price for USA

ISBN 978-3-642-36534-8

free shipping for individuals worldwide

usually dispatched within 3 to 5 business days


add to marked items

  • Most advanced and comprehensive book on high permittivity gate dielectrics
  •  
  • Covers the basics, latest developments, and applications
  • A reference work for researchers, electrical engineers and materials scientists as well as a study text for master and doctor course students
  •  

"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects."

Content Level » Professional/practitioner

Keywords » Advanced gate stacks - Dielectric materials - Gate dielectrics - High permittivity - Nano MOSFETs

Related subjects » Electronics & Electrical Engineering - Engineering - Materials - Optical & Electronic Materials - Optics & Lasers

Table of contents / Preface / Sample pages 

Popular Content within this publication 

 

Articles

Read this Book on Springerlink

Services for this book

New Book Alert

Get alerted on new Springer publications in the subject area of Electronics and Microelectronics, Instrumentation.