Nanoimprint Lithography: An Enabling Process for Nanofabrication
2013, XIII, 249 p. 225 illus., 107 illus. in color.
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Provides consistent multi-disciplinary approach demonstrating principles of the field including latest achievements in hot areas such as nanofabrication and nanotechnology
Includes approximately 200 figures and tables to explain the topic
Presents current status and future trends of nanoimprint lithography research
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Principles and statues of nanoimprint lithography.- Stamp Fabrication.- stamp surface treatment.- Nanoimprint lithography resists.- Nanoimprint lithography process.- Modeling and Simulation of NIL.- Application of NIL in Light emitting Diodes.- Application of NIL in memory devices.- Application of NIL in solar cell.