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Chemical Vapor Deposition Polymerization

The Growth and Properties of Parylene Thin Films

  • Book
  • © 2004

Overview

Authors:
  1. Jeffrey B. Fortin

    1. Department of Engineering Science, Rensselaer Polytechnic Institute, Troy, USA
      GE Global Research Center, Niskayuna, USA

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    You can also search for this author in PubMed   Google Scholar

  2. Toh-Ming Lu

    1. Department of Physics, Rensselaer Polytechnic Institute, Troy, USA

    View author publications

    You can also search for this author in PubMed   Google Scholar

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Table of contents (7 chapters)

  1. Front Matter

    Pages i-xvii
    Download chapter PDF

  2. Introduction

    • Jeffrey B. Fortin, Toh-Ming Lu
    Pages 1-7

  3. Deposition Equipment

    • Jeffrey B. Fortin, Toh-Ming Lu
    Pages 9-22

  4. Step-by-Step Guide to Depositing Parylene

    • Jeffrey B. Fortin, Toh-Ming Lu
    Pages 23-26

  5. Parylene-N Precursor Chemistry

    • Jeffrey B. Fortin, Toh-Ming Lu
    Pages 27-40

  6. Deposition Kinetics for Polymerization via the Gorham Route

    • Jeffrey B. Fortin, Toh-Ming Lu
    Pages 41-55

  7. Film Properties

    • Jeffrey B. Fortin, Toh-Ming Lu
    Pages 57-82

  8. Other CVD Polymers

    • Jeffrey B. Fortin, Toh-Ming Lu
    Pages 83-89

  9. Back Matter

    Pages 91-102
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Keywords

About this book

Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed.
This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

Authors and Affiliations

  • Department of Engineering Science, Rensselaer Polytechnic Institute, Troy, USA

    Jeffrey B. Fortin

  • GE Global Research Center, Niskayuna, USA

    Jeffrey B. Fortin

  • Department of Physics, Rensselaer Polytechnic Institute, Troy, USA

    Toh-Ming Lu

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