Particles in Gases and Liquids 1

1. Front Matter

   Pages i-viii

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2. Monitoring Contaminant Particles in Gases and Liquids: A Review

   • Douglas W. Cooper

   Pages 1-33

3. Measuring and Identifying Particles in Ultrapure Water

   • Marjorie K. Balazs

   Pages 35-50

4. Non-Poisson Models of Particle Counting

   • R. A. Van Slooten, M. L. Malczewski

   Pages 51-79

5. Liquid Particle Counter Comparison

   • C. Willis

   Pages 81-95

6. Particle Counting of Liquid Systems Using a Scanning Electron Microscope

   • W. A. Zorn

   Pages 97-119

7. Improved Methodology for Measurement of Particle Concentrations in Semiconductor Process Chemicals

   • Donald C. Grant

   Pages 121-134

8. Calibration of the Photo-Sedimentometer Lumosed with a Powder of Known Particle Size Distribution

   • M. Hangl, G. Staudinger

   Pages 135-141

9. Particle Contamination Control and Measurement in Ultra-Pure VLSI Grade Inert Gases

   • R. M. Thorogood, A. Schwarz, W. T. McDermott

   Pages 143-156

10. Design and Practical Considerations in Using Cascade Impactors to Collect Particle Samples from Process Gases for Identification

    • W. L. Chiang, R. L. Chuan

    Pages 157-165

11. In-Situ Monitoring of Particulate Contamination in Integrated Circuit Process Equipment

    • Steven D. Cheung

    Pages 167-173

12. A Real-Time Fallout Monitor for 5–250 Micrometer Particles

    • Peter G. Borden, Jon Munson, Donald W. Bartelson

    Pages 175-184

13. Measurement and Control of Particle-Bearing Air Currents in a Vertical Laminar Flow Clean Room

    • G. S. Settles, G. G. Via

    Pages 185-194

14. Particle Deposition Velocity Studies in Silicon Technology

    • D. S. Ensor, A. C. Clayton, T. Yamamoto, R. P. Donovan

    Pages 195-204

15. Influence of Particle Charge on the Collection Efficiency of Electrified Filter Mats

    • M. K. Mazumder, A. M. Siag

    Pages 205-221

16. Particle Retention and Downstream Cleanliness of Point-of-Use Filters for Semiconductor Process Gases

    • Mauro A. Accomazzo, Donald C. Grant

    Pages 223-233

17. A Fluid Dynamic Study of a Microcontaminant Particles Removal Process

    • Ahmed A. Busnaina, M. A. R. Sharif, Glenn Gale, Frederick W. Kern Jr.

    Pages 235-257

18. Particle Removal from Semiconductor Wafers Using Cleaning Solvents

    • V. B. Menon, L. D. Michaels, R. P. Donovan, V. L. Debler, M. B. Ranade

    Pages 259-271

19. Particle Contributions of Three Types of Cleanroom Jumpsuits

    • R. C. White, J. R. Weaver

    Pages 273-281

20. Particulate Generation in Devices Used in Clean Manufacturing

    • H. S. Nagaraj, B. L. Owens, R. J. Miller

    Pages 283-293

This book documents the proceedings of the Symposium on Particles in Fluids: Detection, Characterization and Control held as a part of the 18th Fine Particle Society meeting in Boston, August 3-7, 1987. This was the Premier symposium on this topic and the response was so good that we have decided to organize it on a biennial basis and the second symposium will be held under the rubric Particles in Gases and Liquids: Detection, Characterization and Control at the 20th Fine Particle Society meeting in Boston, August 22-26, 1989. In the modern manufacture of sophisticated and sensitive microelectronic components and other precision parts, there has been a great deal of concern about yield losses due to micrometer- and submicrometer-sized particles. These particles can originate from a number of sources including fluids, i. e. , gases and liquids used in the manufacturing process. So the detection, characterization and control or removal of these undesirable particles is of cardinal importance and this symposium was conceived and o~ganized with this in mind. The purposes of this symposium were to bring together those actively involved in all aspects of particles in fluids, to provide a forum for discussion of the latest techniques for the detection, characterization and control of particles, and to highlight areas which needed intensified R&D efforts. The printed program contained a total of 46 papers and a variety of topics dealing with various ramifications of particles in fluids were presented.

• In silico
• contamination
• distribution
• electron
• electron microscope
• influence
• laminar flow
• paper
• particles
• scanning electron microscope
• semiconductor
• silicon
• society
• water

• IBM US Technical Education, Thornwood, USA

  K. L. Mittal

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